Luke T. Gritter, Sergei Yushanov, Jeffrey S. Crompton, and Kyle C. Koppenhoefer
AltaSim Technologies
Columbus, OH
AltaSim Technologies provides engineering consulting services involving advanced multiphysics modeling such as capacitively coupled plasma (CCP). Plasma etching and deposition of thin films, critical processes in the manufacture of advanced microelectronic devices, commonly utilize CCP, in which the plasma is initiated and sustained by an oscillating electric field between two or more electrodes.
Analysis of CCP is difficult due to the dynamic behavior of the plasma and the large number of RF cycles necessary to reach a periodic steady state. By performing one- and two-dimensional simulations of low-frequency RF discharges in axisymmetric CCP reactors for Maxwellian and non-Maxwellian cases using COMSOL Multiphysics, AltaSim Technologies has developed simulations which can be used to assist with the development of new CCP processing technology.
Suggested Stories
The Science of Water Screening
Johnson Screens® are the manufacturers of steel screens that impede debris from lakes and rivers from entering pipes ...
Metamaterials Make Physics Seem Like Magic
Metamaterials are manufactured, structured materials that they can interact and manipulate wave phenomena such that ...
Researching a New Fuel for the HFIR: Advancements at ORNL Require Multiphysics Simulation to Support Safety and Reliability
In response to the increasing awareness of the risks associated with the proliferation of nuclear materials, the ...
How Reclosers Ensure a Steady Supply of Power: It’s All in the Magnet
When a tree branch touches overhead cables and causes a momentary short circuit, your lights may flicker. A device ...
