Numerical Simulation of Vibrationally Active Ar-H2 Microwave Plasma

F. Bosi [1], M. Magarotto [2], P. de Carlo [2], M. Manente [2], F. Trezzolani [2], D. Pavarin [2], D. Melazzi [2], P. Alotto [1], R. Bertani [1],
[1] Department of Industrial Engineering, University of Padova, Padova, Italy
[2] CISAS "G.Colombo", University of Padova, Padova, Italy
Veröffentlicht in 2016

Microwave discharges have a wide range of applications, such as gas conversion, material processing and surface treatment; also they can provide an efficient way for dissociation of molecular gases as CO2 and N2O. Depending on the operating pressure and temperature, non-equilibrium conditions can be attained within the discharge, where electron temperature, vibrational temperature and translational temperature differ from each other. In this work we address the issue of simulating this non-equilibrium condition choosing as test case the Ar-H2 plasma, which find applications for instance in chemical vapor deposition of diamond films or in nuclear fusion research for deuterium production.

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