Luke T. Gritter, Sergei Yushanov, Jeffrey S. Crompton, and Kyle C. Koppenhoefer
AltaSim Technologies
Columbus, OH
AltaSim Technologies provides engineering consulting services involving advanced multiphysics modeling such as capacitively coupled plasma (CCP). Plasma etching and deposition of thin films, critical processes in the manufacture of advanced microelectronic devices, commonly utilize CCP, in which the plasma is initiated and sustained by an oscillating electric field between two or more electrodes.
Analysis of CCP is difficult due to the dynamic behavior of the plasma and the large number of RF cycles necessary to reach a periodic steady state. By performing one- and two-dimensional simulations of low-frequency RF discharges in axisymmetric CCP reactors for Maxwellian and non-Maxwellian cases using COMSOL Multiphysics, AltaSim Technologies has developed simulations which can be used to assist with the development of new CCP processing technology.
Suggested Stories
The Sight of Sound: Revealing the Effects of Enclosure Design on Loudspeaker Performance
L-Acoustics uses acoustics simulation to optimize their bass reflex speakers for sound systems in arenas and concert ...
Keynote: Simulation of MEMS Sensors at Bosch
In this keynote talk at the COMSOL Conference 2025 Amsterdam, Daniel Maier of Bosch discusses MEMS sensors and the ...
Application Builder and COMSOL Server: A Review
William Vetterling, research fellow and manager of the Image Science Laboratory at Zink Imaging, created an intuitive ...
Charakterisierung von piezoelektrischen Sensoren für die zerstörungsfreie Prüfung
Piezoelektrische Sensoren müssen sorgfältig entworfen und kalibriert werden. Die Simulation kann helfen, diesen ...
