Harmonic Content of the Power Deposition into a Dual Frequency Capacitively Coupled Plasma
Application ID: 10218
Energy transfer from the time varying electrostatic field to electrons in a capacitively coupled plasmas (CCP) does not exclusively occur at twice the RF frequency. Due to the highly nonlinear mechanism of power transfer from the fields to the electrons, power deposition occurs at frequencies higher than twice the driving frequency. For dual frequency CCP reactors the harmonic content of the power deposition occurs at many different frequencies.
This model example illustrates applications of this type that would nominally be built using the following products:Plasma Module
however, additional products may be required to completely define and model it. Furthermore, this example may also be defined and modeled using components from the following product combinations:
The combination of COMSOL® products required to model your application depends on several factors and may include boundary conditions, material properties, physics interfaces, and part libraries. Particular functionality may be common to several products. To determine the right combination of products for your modeling needs, review the Specification Chart and make use of a free evaluation license. The COMSOL Sales and Support teams are available for answering any questions you may have regarding this.